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Electronic and structural properties of molybdenum thin films as determined by real-time spectroscopic ellipsometry
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10.1063/1.3117222
/content/aip/journal/apl/94/14/10.1063/1.3117222
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/14/10.1063/1.3117222
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Surface roughness and bulk layer thicknesses vs deposition time obtained by RTSE (lines) for Mo depositions at three Ar pressures. Also shown are scaled AFM rms roughness values for the final films at the extremes in pressure (points).

Image of FIG. 2.
FIG. 2.

Bulk layer dielectric functions of (a) one Mo film at two representative bulk layer thicknesses at an Ar pressure of 4 mTorr and (b) two Mo films deposited at different Ar pressures at a fixed value of 110 nm.

Image of FIG. 3.
FIG. 3.

Free electron relaxation time plotted as a function of bulk layer thickness for Mo films deposited at three different deposition pressures. Also shown are the results of fits using a simple conical grain growth model.

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/content/aip/journal/apl/94/14/10.1063/1.3117222
2009-04-08
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electronic and structural properties of molybdenum thin films as determined by real-time spectroscopic ellipsometry
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/14/10.1063/1.3117222
10.1063/1.3117222
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