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Surface roughness and bulk layer thicknesses vs deposition time obtained by RTSE (lines) for Mo depositions at three Ar pressures. Also shown are scaled AFM rms roughness values for the final films at the extremes in pressure (points).
Bulk layer dielectric functions of (a) one Mo film at two representative bulk layer thicknesses at an Ar pressure of 4 mTorr and (b) two Mo films deposited at different Ar pressures at a fixed value of 110 nm.
Free electron relaxation time plotted as a function of bulk layer thickness for Mo films deposited at three different deposition pressures. Also shown are the results of fits using a simple conical grain growth model.
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