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Hafnium oxide/germanium oxynitride gate stacks on germanium: Capacitance scaling and interface state density
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10.1063/1.3116624
/content/aip/journal/apl/94/18/10.1063/1.3116624
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/18/10.1063/1.3116624
/content/aip/journal/apl/94/18/10.1063/1.3116624
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/content/aip/journal/apl/94/18/10.1063/1.3116624
2009-05-04
2014-11-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hafnium oxide/germanium oxynitride gate stacks on germanium: Capacitance scaling and interface state density
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/18/10.1063/1.3116624
10.1063/1.3116624
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