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Notch insensitive fracture in nanoscale thin films
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10.1063/1.3157276
/content/aip/journal/apl/94/25/10.1063/1.3157276
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/25/10.1063/1.3157276
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Figures

Image of FIG. 1.
FIG. 1.

Experimental setup for in situ fracture testing of nanoscale freestanding thin films inside the TEM. (a) Tip of the custom built electrical biasing specimen holder, (b) the nanofabricated tension/fracture testing device with a through-hole below the specimen for the transmission electrons, (c) TEM image of the notch milled on the specimen using focused ion beam, (d) low magnification TEM image showing the intact notch after specimen fracture.

Image of FIG. 2.
FIG. 2.

Experimental results, (a) Stress-strain diagram for a notched aluminum specimen. In situ TEM images of the notched region at (b) 15 MPa, (c) 305 MPa and (d) 460 MPa nominal stress. The notch remains intact after failure.

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/content/aip/journal/apl/94/25/10.1063/1.3157276
2009-06-22
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Notch insensitive fracture in nanoscale thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/25/10.1063/1.3157276
10.1063/1.3157276
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