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High performance metal-insulator-metal capacitor using a bilayer
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10.1063/1.3158951
/content/aip/journal/apl/94/25/10.1063/1.3158951
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/25/10.1063/1.3158951

Figures

Image of FIG. 1.
FIG. 1.

Quadratic coefficient as a function of capacitance density for different materials of the literature. The figure of merit is expressed in . The shaded area represents long term (2016) ITRS requirements (Ref. 12).

Image of FIG. 2.
FIG. 2.

Normalized capacitance vs bias for a 20 nm STO layer (as-deposited, annealed in air at , and annealed in air at ).

Image of FIG. 3.
FIG. 3.

Normalized capacitance vs bias for stacks. The stacks make use of STO annealed at (upper curves) or at (lower curves). Best performances are obtained with .

Tables

Generic image for table
Table I.

Capacitance density, experimental quadratic coefficient, and theoretical quadratic coefficient calculated from Eq. (1), where , (this work), , (Ref. 10), and leakage current of capacitors. STO was postannealed in air at during 1 h.

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/content/aip/journal/apl/94/25/10.1063/1.3158951
2009-06-23
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High performance metal-insulator-metal capacitor using a SrTiO3/ZrO2 bilayer
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/25/10.1063/1.3158951
10.1063/1.3158951
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