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Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting
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10.1063/1.3171930
/content/aip/journal/apl/94/26/10.1063/1.3171930
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/26/10.1063/1.3171930
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of soft roller nanoimprint technique.

Image of FIG. 2.
FIG. 2.

(a) A SEM image of imprinted moth-eye pattern in 450 nm period in the resist on silicon surface. The detail is shown in the inset. SEM images of silicon NSs NS1, NS2, and NS3 are shown in (b), (c), and (d), respectively.

Image of FIG. 3.
FIG. 3.

Measured reflection spectra under normal incidence for a bare polished silicon wafer (bold solid line) and NS1 (dash line). Theoretical reflection spectrum (dash dot line) for a AR coating and experiment results (dot line) in Ref. 4 are shown for comparison.

Image of FIG. 4.
FIG. 4.

Measured angle-dependent reflection spectra from NS1 at 10°, 15°, 30°, 45°, and 60°. The spectrum at 15° overlaps with that at 10°.

Image of FIG. 5.
FIG. 5.

Measured angle-dependent reflection averaged over the 400–1000 nm wavelength range from NS1, NS2, NS3, and NS4 at 10°, 15°, 30°, 45°, and 60°. The intensity of the reflected light from a bare silicon sample normalized to that at normal incidence is shown as a function of incident angle.

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/content/aip/journal/apl/94/26/10.1063/1.3171930
2009-07-02
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/26/10.1063/1.3171930
10.1063/1.3171930
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