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Schematic of soft roller nanoimprint technique.
(a) A SEM image of imprinted moth-eye pattern in 450 nm period in the resist on silicon surface. The detail is shown in the inset. SEM images of silicon NSs NS1, NS2, and NS3 are shown in (b), (c), and (d), respectively.
Measured reflection spectra under normal incidence for a bare polished silicon wafer (bold solid line) and NS1 (dash line). Theoretical reflection spectrum (dash dot line) for a AR coating and experiment results (dot line) in Ref. 4 are shown for comparison.
Measured angle-dependent reflection spectra from NS1 at 10°, 15°, 30°, 45°, and 60°. The spectrum at 15° overlaps with that at 10°.
Measured angle-dependent reflection averaged over the 400–1000 nm wavelength range from NS1, NS2, NS3, and NS4 at 10°, 15°, 30°, 45°, and 60°. The intensity of the reflected light from a bare silicon sample normalized to that at normal incidence is shown as a function of incident angle.
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