1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Atomic layer deposition of high- dielectrics on germanium reaching 0.5 nm equivalent oxide thickness
Rent:
Rent this article for
USD
10.1063/1.3173199
/content/aip/journal/apl/94/26/10.1063/1.3173199
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/26/10.1063/1.3173199
/content/aip/journal/apl/94/26/10.1063/1.3173199
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/94/26/10.1063/1.3173199
2009-07-02
2014-08-01
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic layer deposition of ZrO2/La2O3 high-k dielectrics on germanium reaching 0.5 nm equivalent oxide thickness
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/26/10.1063/1.3173199
10.1063/1.3173199
SEARCH_EXPAND_ITEM