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Effects of organic film morphology on the formation of Rb clusters on surface coatings in alkali metal vapor cells
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10.1063/1.3073711
/content/aip/journal/apl/94/4/10.1063/1.3073711
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/4/10.1063/1.3073711
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XP spectra of , , and core levels for a clean OTS monolayer (lower curves) and a Rb-exposed OTS monolayer (upper curves). The spectrum is resolved into two components; a primary peak at 532.4 eV attributed to oxygen originally in the substrate and OTS film, and a secondary peak at 529.7 eV attributed to O atoms reacted with Rb. The spectrum is resolved into two components; a primary peak 103.3 eV attributed to Si in the substrate and OTS film originally, and a secondary peak at 102.1 eV attributed to Si atoms reacted with Rb.

Image of FIG. 2.
FIG. 2.

Angle-resolved XP spectra of and core levels for a Rb-exposed OTS bilayer. The angle between the sample surface and photoelectron analyzer is given in each frame. The peaks are as described in Fig. 1 . There are two peaks due to spin-orbit splitting.

Image of FIG. 3.
FIG. 3.

(a) is a height image of a Rb-exposed OTS monolayer measured with an AFM. The protrusions are Rb containing clusters. (b) is a height image of a Rb-exposed OTS bilayer measured with an AFM.

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/content/aip/journal/apl/94/4/10.1063/1.3073711
2009-01-29
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of organic film morphology on the formation of Rb clusters on surface coatings in alkali metal vapor cells
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/4/10.1063/1.3073711
10.1063/1.3073711
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