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Enhanced resolution and high aspect-ratio semiconductor nanopatterning by metal overcoating
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10.1063/1.3080207
/content/aip/journal/apl/94/6/10.1063/1.3080207
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/6/10.1063/1.3080207
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Scanning electron microscopy (SEM) cross-section image of milling depth profile for well-separated features wide with different ion doses (a) bare GaAs sample and (b) 20 nm coated GaAs sample. (c) Calculated profiles for similar depth for bare sample (dashed red) and coated one (solid blue).

Image of FIG. 2.
FIG. 2.

SEM cross-section image of milling depth profile for wide features with various separations (a) bare GaAs sample (b) 20 nm coated GaAs sample. (c) Calculated profiles for similar depth for bare sample (dashed red) and coated one (solid blue).

Image of FIG. 3.
FIG. 3.

SEM cross-section image features (a) – bare semiconductor sample. (b) −20 nm coated semiconductor sample.

Image of FIG. 4.
FIG. 4.

Transmission spectrum of a microcavity based on deep FIB milled gratings experimental (triangles) and calculated (solid line). The inset is a SEM image of the microcavity.

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/content/aip/journal/apl/94/6/10.1063/1.3080207
2009-02-09
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced resolution and high aspect-ratio semiconductor nanopatterning by metal overcoating
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/6/10.1063/1.3080207
10.1063/1.3080207
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