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High energy part of the imaginary part of the pseudodielectric function of intrinsic, -, and -type films: (a) before and after, (b) , (c) , and (d) of plasma exposure. The inset is a schematic of the multilayer optical model used to fit the SE measurements after the plasma treatment.
Time evolution of (a) the thickness and (b) the hydrogen excess during the plasma exposure. The segments indicate the maximum error bars and the curves are provided as guides for the eyes.
Time evolution of the characteristics of the grown layer vs the plasma exposure time: (a) the crystalline fraction and (b) the fraction of voids at the bottom side and (c) the crystalline fraction and (d) the fraction of voids at the top side, and (e) the Si amount in the layer. The segments indicate the maximum error bars and the curves are provided as guides for the eyes.
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