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(a) Optical image of an array of pixels on which metal nanostructures have been fabricated by FIB. The red box outlines a pixel (electronics and active area), which is the smallest unit cell. The green box outlines the active (light sensitive) area. The lines outside the active area are for the electronics. (b) Scheme of slit and groove structure. (c) SEM picture of a slit in Au on an active area of a ViSi pixel. The polarization directions are indicated. (d) Scheme of the experimental setups for measuring glass cover slip sample (left) and for detector sample (right).
TM-normalized transmission of a slit and groove structure with parameters , , , and . (a) (Inset) Theoretical calculations from the modal expansion method showing the normalized transmission . (Inset) Assuming a maximum collection angle (a) eta for the collection of the structures on the glass slide. The maximum when the collection angle . (b) Experimental values on glass cover slip, the maximum for the collection angle is .
TM-normalized transmission of slit and groove structure with parameters , , , and . (a) Theoretical calculations from the modal expansion method showing the normalized transmission for the structures on the ViSi. The maximum for a collection angle . (b) Experimental values on the ViSi, which shows an for the collection angle .
Nonnormalized polarization dependant transmission spectra of a slit and groove structure on detector. The structure is that which has . The inset shows the spectrum of the extinction ratio.
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