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Peak decomposition of Ni core level of Ni-rich NiO thin film.
(a) AFM two-dimensional images and (b) AFM three-dimensional images of the surface morphology of Ni/NiO thin film over a scan area of .
Shifts in characteristics (a) after an application of −10 V for 1 and 60 s and (b) after an application of for 5 and 200 s, respectively.
(a) Flatband voltage shift as a function of charging time at −10 and and (b) as a function of charging voltage for different charging time.
(a) Shifts in characteristics after an application of −15 V for 5 s and for 5 s. Inset: equivalent capacitance circuit for the MIS structure with nc-Ni embedded in NiO thin film. (b) capacitance modulation as a function of charging time at −10 and .
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