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Ion implantation and energy loss effect during high-voltage pulsed glow discharge in a tube
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10.1063/1.3225155
/content/aip/journal/apl/95/10/10.1063/1.3225155
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/10/10.1063/1.3225155
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Oscilloscope traces of the probe potential for different plasma modes.

Image of FIG. 2.
FIG. 2.

Influence of the pressure and the bias on the spectrum intensity.

Image of FIG. 3.
FIG. 3.

AES depth profile of the sample inside the tube for different parameters. (a) 15 kV, 1.5 Pa; (b) 15 kV, 0.8 Pa; (c) 20 kV, 0.8 Pa; and (d) 20 kV, 1.5 Pa.

Image of FIG. 4.
FIG. 4.

Comparison of the peak implantation depths inside and outside the tube under different working conditions. (a) 15 kV, 1.5 Pa; (b) 15 kV, 0.8 Pa; (c) 20 kV, 0.8 Pa; and (d) 20 kV, 1.5 Pa.

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/content/aip/journal/apl/95/10/10.1063/1.3225155
2009-09-09
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ion implantation and energy loss effect during high-voltage pulsed glow discharge in a tube
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/10/10.1063/1.3225155
10.1063/1.3225155
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