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Schematic view of the dual-frequency capacitively coupled plasma (CCP) reactor.
[(a) and (b)] Normalized 2 MHz voltage and current , [(c) and (d)] electron density and effective electron temperature , and (e) normalized ion flux onto the electrode as a function of 2 MHz power at the discharge conditions of 50 mTorr, and 300 mTorr, . The index denotes the low-frequency and denotes the high-frequency.
(a) Evolution of the EEPF with 2 MHz power and (b) capacitive bulk electric field as a function of 2 MHz power at the discharge condition of 50 mTorr and .
Evolution of the EEPF with 2 MHz power at the discharge conditions of (a) 300 mTorr, and (b) 300 mTorr, .
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