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Role of low-frequency power in dual-frequency capacitive discharges
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10.1063/1.3223593
/content/aip/journal/apl/95/11/10.1063/1.3223593
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3223593
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic view of the dual-frequency capacitively coupled plasma (CCP) reactor.

Image of FIG. 2.
FIG. 2.

[(a) and (b)] Normalized 2 MHz voltage and current , [(c) and (d)] electron density and effective electron temperature , and (e) normalized ion flux onto the electrode as a function of 2 MHz power at the discharge conditions of 50 mTorr, and 300 mTorr, . The index denotes the low-frequency and denotes the high-frequency.

Image of FIG. 3.
FIG. 3.

(a) Evolution of the EEPF with 2 MHz power and (b) capacitive bulk electric field as a function of 2 MHz power at the discharge condition of 50 mTorr and .

Image of FIG. 4.
FIG. 4.

Evolution of the EEPF with 2 MHz power at the discharge conditions of (a) 300 mTorr, and (b) 300 mTorr, .

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/content/aip/journal/apl/95/11/10.1063/1.3223593
2009-09-15
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Role of low-frequency power in dual-frequency capacitive discharges
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3223593
10.1063/1.3223593
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