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Nonpolar -plane GaN on patterned Si(112) substrates by metalorganic chemical vapor deposition
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10.1063/1.3225157
/content/aip/journal/apl/95/11/10.1063/1.3225157
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3225157
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Figures

Image of FIG. 1.
FIG. 1.

Schematic depiction of selective area -plane GaN growth on patterned Si(112) substrates. Since growth is initiated on the vertical sidewalls, the threading dislocations propagate along the -axis and not toward the surface.

Image of FIG. 2.
FIG. 2.

(a) An angled cross-sectional SEM image of a patterned Si(112) substrate ready for GaN epitaxy, where the vertical sidewall is covered by AlN. The top Si(112) plane and the tilted Si(111) plane are both masked with . (b) Plan-view and (c) angled cross-sectional SEM images of an -GaN sample grown on a patterned Si(112) substrate after a 3 h growth. (d) Enlarged cross-sectional SEM image showing the growth of the m-GaN initiated at the vertical sidewalls.

Image of FIG. 3.
FIG. 3.

(a) On-axis XRD scan showing that the GaN has -plane orientation. The Si(112) plane does not have a diffraction peak due to diffraction extinction. The inset shows the off-axis scan results, suggesting that is oriented 180° away from Si(111). (b) XRD rocking curves of -plane after a 3 h growth, rocking toward the GaN -axis and -axis.

Image of FIG. 4.
FIG. 4.

Room-temperature PL spectra measured with a He–Cd laser at different excitation densities for 6-nm-thick InGaN DH LED active layers on (a) -GaN on sapphire and (b) -GaN on Si. No blueshift is observed in the emission peak of the -plane sample. The excitation power densities in [(a) and (b)] were 0.05, 0.15, 0.52, 1.0, 2.0, 2.5, and . The inset in (b) shows the IQEs of both samples extracted from the excitation dependence of the PL intensity using a Ti-sapphire laser (370 nm).

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/content/aip/journal/apl/95/11/10.1063/1.3225157
2009-09-14
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nonpolar m-plane GaN on patterned Si(112) substrates by metalorganic chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3225157
10.1063/1.3225157
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