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Contaminant gas removal using thin-film Ti electrode microdischarges
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10.1063/1.3226679
/content/aip/journal/apl/95/11/10.1063/1.3226679
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3226679
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Figures

Image of FIG. 1.
FIG. 1.

Gas purification device. (a) A dc voltage is applied to selectively remove nitrogen and oxygen. (b) Photograph of a single device. (c) Photograph of a device in a hybrid package that includes the optical emission sensor as well as a pressure sensor Ref. 18.

Image of FIG. 2.
FIG. 2.

Spectra of the pump discharge (normalized to helium at 667.8 nm) in 99.25% helium with air contamination at 27 kPa (a) before purification and (b) after purification. Small amounts of nitrogen cause intense emission lines compared to helium at , demonstrating the necessity of nitrogen removal.

Image of FIG. 3.
FIG. 3.

Spectra of acetone sample (normalized to helium at 667.8 nm) backfilled with helium during gas purification at . (a) Spectrum recorded before purification, showing strong nitrogen emissions and low emissions. (b) Spectrum recorded after purification, showing diminished nitrogen and increased CN and emissions.

Image of FIG. 4.
FIG. 4.

Ratio of carbon to nitrogen emission line intensity during gas purification at , based on their strongest emission lines.

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/content/aip/journal/apl/95/11/10.1063/1.3226679
2009-09-16
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Contaminant gas removal using thin-film Ti electrode microdischarges
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3226679
10.1063/1.3226679
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