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Improvement of interface properties by oxidation using hydrogen peroxide
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10.1063/1.3231923
/content/aip/journal/apl/95/11/10.1063/1.3231923
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3231923
/content/aip/journal/apl/95/11/10.1063/1.3231923
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/content/aip/journal/apl/95/11/10.1063/1.3231923
2009-09-17
2014-12-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improvement of SiO2/4H-SiC interface properties by oxidation using hydrogen peroxide
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3231923
10.1063/1.3231923
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