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Self-organized vertically aligned single-crystal silicon nanostructures with controlled shape and aspect ratio by reactive plasma etching
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10.1063/1.3232210
/content/aip/journal/apl/95/11/10.1063/1.3232210
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3232210
/content/aip/journal/apl/95/11/10.1063/1.3232210
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/content/aip/journal/apl/95/11/10.1063/1.3232210
2009-09-18
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-organized vertically aligned single-crystal silicon nanostructures with controlled shape and aspect ratio by reactive plasma etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/11/10.1063/1.3232210
10.1063/1.3232210
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