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Dependence of resolution on aluminum layer thickness. The numbers at the graph indicate the wavelengths for which these optimum resolutions are achieved.
(a) Electric field distribution around an aluminum superlens with double line source excitation at 145 nm wavelength. The black (solid), red (dash), and green (dash dot) lines represent the positions of the cross sections at 10, 20, and 30 nm above the lens, respectively. (b) The intensity profiles at different image distances (cross sections).
Sample structure. (a) Sketch of the whole sample structure. The exposure is performed through the substrate. (b) TEM cross section of a sample structure after spin coating of spin-on glass and before back thinning.
SEM images of the PMMA surface with resolved double slits (area exposed with six pulses). (a) 90 nm separation and (b) 70 nm separation.
AFM scan of the PMMA surface above the double slits with 70 nm separation (area exposed with six pulses). (a) Topography image. The white framed area was used for the averaging procedure. Red and green lines represent the directions of averaging. (b) Averaged PMMA surface profile confirming the double grooves.
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