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Schematic representation of the UHV deposition chamber and of the opical chamber with the fiber setup.
Optical transmission for a 80 nm Na–Al–H film in the as deposited (lower curve) and annealed state (upper curve). The thin lines represent a Bruggeman-EMA fit where was used as a matrix material and Al (19%) as a impurity for the as deposited film. In the case of the annealed film, NaH was used as a matrix material, with 3% of Al impurity.
Infrared transmission for a film in the as-deposited and annealed state. The inset shows a zoom over the region for the as deposited sample, to be compared with Fig. 6 of Ref. 10 .
Optical transmission for the 2.5% sample in the as deposited and annealed state (panel a) and for the 8% Ti (panel b).
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