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(a) The x-ray diffraction patterns of as-deposited and structurally relaxed NiTi films. (b) The crystallization behavior of NiTi films recorded by DSC.
The structural relaxation effect on the mechanical behavior of sputtered NiTi films revealed by nanoindentation. The first pop-in event is enlarged in the inset and indicated using a dot.
(a) SEM images of the crystallization of sputtered NiTi films at . Upper: as-deposited; bottom: after relaxation at for 120 min. (b) The crystallization fraction as a function of time for the as-deposited and relaxed sample.
The grain size distribution of fully crystallized NiTi films for (a) as-deposited and (b) post relaxation treatment samples. The TEM image of a typical microstructure is provided. (c) The transformation behavior measured using wafer curvature methods. The samples were crystallized at with and without a relaxation treatment.
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