1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
In situ studies of and dielectrics on graphite
Rent:
Rent this article for
USD
10.1063/1.3238560
/content/aip/journal/apl/95/13/10.1063/1.3238560
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/13/10.1063/1.3238560
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

O , C , and Al spectra for graphite sample with predeposition anneal at to remove physisorbed interfacial hydroxyls (a) Al as-deposited and (b) Al oxidized in 1000 mbar at for 10 min. Sample without predeposition anneal (c) Al as-deposited and (d) oxidized under the same conditions as (b).

Image of FIG. 2.
FIG. 2.

AFM image and feature heights showing comparison of (a) 1 nm and (b) 1 nm on natural graphite. Large (10 nm) clusters form after deposition of Al and oxidation at in dry , in contrast to which is substantially more uniform.

Image of FIG. 3.
FIG. 3.

1 nm Hf deposited on (a) exfoliated graphite with deposition chamber walls at and , (b) annealed graphite with chamber walls cooled by liquid and , (c) Hf oxidized in 1000 mbar at , (d) deposited by reactive e-beam deposition with partial pressure of . A difference spectrum between the two C peaks is shown in (e); the peak for sample (c) is broader than (d) by 0.13 eV.

Loading

Article metrics loading...

/content/aip/journal/apl/95/13/10.1063/1.3238560
2009-09-28
2014-04-17
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ studies of Al2O3 and HfO2 dielectrics on graphite
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/13/10.1063/1.3238560
10.1063/1.3238560
SEARCH_EXPAND_ITEM