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Understanding the relation between stress and surface morphology in sputtered films: Atomistic simulations and experiments
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10.1063/1.3246791
/content/aip/journal/apl/95/15/10.1063/1.3246791
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/15/10.1063/1.3246791
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Evolution of stress-thickness during growth of sputtered Be films at RT with no sample bias (black curve), RT with sample bias of 80 V (red curve), and with sample bias of 80 V (blue curve). The inset shows the incremental stress for the same films.

Image of FIG. 2.
FIG. 2.

Snapshots of a Be film deposited at for different values of the and different thicknesses. (a) after deposition of 90 ML, (b)–(d) after deposition of 10, 65, and 110 ML, respectively (ML stands for monolayers).

Image of FIG. 3.
FIG. 3.

Porosity as a function of film thickness after deposition of 110 ML at and an [Fig. 2(c)]. The inset shows the evolution of porosity during growth.

Image of FIG. 4.
FIG. 4.

SEM images of Be films grown at a temperature of , pressure of 5 mTorr, and sample bias of 100 V for thicknesses of (a) 1900 and (b) 9000 nm.

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/content/aip/journal/apl/95/15/10.1063/1.3246791
2009-10-16
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Understanding the relation between stress and surface morphology in sputtered films: Atomistic simulations and experiments
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/15/10.1063/1.3246791
10.1063/1.3246791
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