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The significance of core-level electron binding energies on the proper analysis of InGaAs interfacial bonding
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10.1063/1.3249577
/content/aip/journal/apl/95/15/10.1063/1.3249577
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/15/10.1063/1.3249577
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

X-ray photoelectron spectra showing the marked difference in oxide signal due to the different photoelectron escape depths of the (a) and (b) core-level electrons. Note that these spectra are from the exact same sample.

Image of FIG. 2.
FIG. 2.

X-ray photoelectron spectra showing the detection of Ga-oxides in the (a) core-level electron spectrum while the Ga-oxide signal is at or below the level of detection in the (b) region for the exact same treated GaAs surface with 1 nm ALD deposited . For comparison, (c) the region of a native oxide/GaAs surface with detectable Ga-oxide is shown.

Image of FIG. 3.
FIG. 3.

Theoretical oxide peak to bulk peak ratio for and spectra vs thickness. The regions are much more sensitive to changes in oxide thickness.

Image of FIG. 4.
FIG. 4.

Asymmetric lineshape of the photoelectron spectrum. This asymmetry is due to core-hole screening rather than the presence of In-oxides. The absence of oxygen is shown in the spectrum in the inset.

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/content/aip/journal/apl/95/15/10.1063/1.3249577
2009-10-14
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The significance of core-level electron binding energies on the proper analysis of InGaAs interfacial bonding
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/15/10.1063/1.3249577
10.1063/1.3249577
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