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High optical quality InAs site-controlled quantum dots grown on soft photocurable nanoimprint lithography patterned GaAs substrates
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10.1063/1.3255015
/content/aip/journal/apl/95/17/10.1063/1.3255015
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/17/10.1063/1.3255015
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Scanning electron micrographs of a size GaAs substrate patterned with nanopores and a periodicity of 200 nm.

Image of FIG. 2.
FIG. 2.

AFM images and line scans of patterned GaAs substrate using: [(a) and (c)] wet etching and [(b) and (d)] dry etching techniques prior to QDs regrowth.

Image of FIG. 3.
FIG. 3.

AFM images and line scans of patterned GaAs substrate: [(a) and (c)] after atomic hydrogen cleaning at and [(b) and (d)] after thermal desorption at , prior to InAs QDs regrowth.

Image of FIG. 4.
FIG. 4.

AFM images of patterned GaAs substrate after 30 ML GaAs buffer layer and 3 ML InAs layer are deposited on (a) wet-etched and (b) dry-etched GaAs patterned surfaces.

Image of FIG. 5.
FIG. 5.

Room temperature photoluminescence spectra of self-assembled QDs (SAQDs) grown on unpatterned GaAs substrates (dashed line) and site-controlled QDs (SCQDs) grown on wet etching patterned GaAs substrates (solid line).

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/content/aip/journal/apl/95/17/10.1063/1.3255015
2009-10-27
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High optical quality InAs site-controlled quantum dots grown on soft photocurable nanoimprint lithography patterned GaAs substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/17/10.1063/1.3255015
10.1063/1.3255015
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