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Kinetics of a transient silicide during the reaction of Ni thin film with (100)Si
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10.1063/1.3257732
/content/aip/journal/apl/95/18/10.1063/1.3257732
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/18/10.1063/1.3257732
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

In situ XRD measurement.

Image of FIG. 2.
FIG. 2.

Variation vs temperature of the XRD intensity of the (square) and circle) diffracted peaks during in situ heat treatment from 120 to . The continuous lines correspond to the simulation.

Image of FIG. 3.
FIG. 3.

DSC signal vs sample temperature measured during sample annealing following a ramp of 25, 50, 75, and . The continuous lines correspond to the simulation.

Image of FIG. 4.
FIG. 4.

Schematic of the model for the behavior of the transient phase. This model was used to simulate the DSC and XRD experiment.

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/content/aip/journal/apl/95/18/10.1063/1.3257732
2009-11-02
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Kinetics of a transient silicide during the reaction of Ni thin film with (100)Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/18/10.1063/1.3257732
10.1063/1.3257732
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