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Growth-temperature dependence [(a) and (b)] and thermal stability [(c) and (d)] of Pt(111) layers on STO substrate. AFM topographic image and corresponding profiles of 17 nm Pt layer grown at (a) and (b) . Inset in (b) is a XRD area scan confirming the epitaxial nature of the Pt layer deposited at . SEM image of Pt layers after annealing in typical oxide-deposition conditions (25 min at in 75 mTorr ) for (c) 17 nm and (d) 96 nm thick layers. Insets in (c) and (d) are zooms.
SEM images of YMO films deposited at on Pt layers of thickness of [(a) and (b)] 17 nm, [(c) and (d)] 48 nm, and [(e) and (f)] 96 nm on STO substrate [(a), (c), and (e)] and AO substrate [(b), (d), and (f)]. Inset in (a) is a RHEED pattern taken during epitaxial YMO growth (at 70 nm of YMO growth) indicating a flat growing surface. Inset in (b) is a zoom to better visualize both flat (A) and agglomerated (B) regions.
(a) Growth diagram of YMO films (regarding crystalline and morphological quality), presented in function of YMO deposition temperature and Pt layer thickness, with both substrates. (b) XRD scan, (c) SEM image and -scan (inset) of YMO/Pt/STO heterostructure grown in the conditions marked by a cross in the diagram in (a) (i.e., YMO grown at on 48-nm-thick Pt layer).
rms surface roughness, from scans of continous areas, of Pt films and YMO films (grown at 400 and , respectively) on both substrates (STO and AO), for the three different Pt layer thicknesses.
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