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On the surface roughness development of hydrogenated amorphous silicon deposited at low growth rates
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10.1063/1.3179151
/content/aip/journal/apl/95/2/10.1063/1.3179151
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/2/10.1063/1.3179151
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Surface roughness layer thickness development as a function of bulk film thickness for depositions (a) without substrate biasing and (b) with substrate biasing.

Image of FIG. 2.
FIG. 2.

Growth exponent determined from the roughness development in the steady growth phase shown in Fig. 1.

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/content/aip/journal/apl/95/2/10.1063/1.3179151
2009-07-15
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: On the surface roughness development of hydrogenated amorphous silicon deposited at low growth rates
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/2/10.1063/1.3179151
10.1063/1.3179151
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