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Hall resistance as a function of Al thickness for samples in the as-deposited state and after annealing at 250 and .
Hall resistance as a function of the magnetic field applied perpendicular to the layer plane for samples for different Al thicknesses in the as-deposited state (the inset shows an enlarged area).
Variation of the anisotropy field as a function of Al thickness for samples in the (a) as-deposited state, (b) after annealing at , and (c) . Inset: Sketch of the microstructures in as-deposited (a) and annealed states [(b) and (c)].
Cross-section HRTEM images of before (a) and after (c) heat treatment at . [(b) and (d)] correspond to dark field images of the same samples as in [(a) and (c)] but on different zones.
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