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Shows the XRD patterns for ZrTaTiNbSi alloy target and as-deposited alloy thin films, respectively.
Are the XRD patterns of the ZrTaTiNbSi alloy thin films for as-deposited and annealed at various temperatures from 473 to 1173 K.
The HRTEM bright-field image and diffraction patterns: (a) the as-deposited and (b) 1173 K annealed; (c) showed the reduced radial distribution function derived from diffraction patterns. Figure 4(d) shows the atomic sketch of tetrahedron in the annealed ZrTaTiNbSi amorphous films.
Show the ESCA results at Si peaks position for: (a) the as-deposited and (b) annealed at 1173 K ZrTaTiNbSi alloy thin films, respectively.
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