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Effect of annealing on atomic ordering of amorphous ZrTaTiNbSi alloy
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10.1063/1.3273387
/content/aip/journal/apl/95/24/10.1063/1.3273387
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/24/10.1063/1.3273387
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Shows the XRD patterns for ZrTaTiNbSi alloy target and as-deposited alloy thin films, respectively.

Image of FIG. 2.
FIG. 2.

Are the XRD patterns of the ZrTaTiNbSi alloy thin films for as-deposited and annealed at various temperatures from 473 to 1173 K.

Image of FIG. 3.
FIG. 3.

The HRTEM bright-field image and diffraction patterns: (a) the as-deposited and (b) 1173 K annealed; (c) showed the reduced radial distribution function derived from diffraction patterns. Figure 4(d) shows the atomic sketch of tetrahedron in the annealed ZrTaTiNbSi amorphous films.

Image of FIG. 4.
FIG. 4.

Show the ESCA results at Si peaks position for: (a) the as-deposited and (b) annealed at 1173 K ZrTaTiNbSi alloy thin films, respectively.

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/content/aip/journal/apl/95/24/10.1063/1.3273387
2009-12-16
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of annealing on atomic ordering of amorphous ZrTaTiNbSi alloy
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/24/10.1063/1.3273387
10.1063/1.3273387
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