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In-situ characterization of rapid crystallization of amorphous CoFeB electrodes in CoFeB/MgO/CoFeB junctions during thermal annealing
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10.1063/1.3273397
/content/aip/journal/apl/95/24/10.1063/1.3273397
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/24/10.1063/1.3273397
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) TMR curves of a junction with 1.4 nm MgO barrier after annealing for different time durations at . (b) XRD patterns for the sample before and after the annealing process.

Image of FIG. 2.
FIG. 2.

(a) Evolution of the CoFeB (002) Bragg peak during the annealing. (b) Volume fraction of crystallized CoFeB film vs annealing time at . The solid line is the fit to the JMA model. Inset shows the determination of effective activation energy of the crystallization.

Image of FIG. 3.
FIG. 3.

(a) High resolution cross-sectional TEM image for the MTJ annealed for 90 min at and (b) high resolution cross-sectional TEM image for the MTJ annealed for 3 min at .

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/content/aip/journal/apl/95/24/10.1063/1.3273397
2009-12-14
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In-situ characterization of rapid crystallization of amorphous CoFeB electrodes in CoFeB/MgO/CoFeB junctions during thermal annealing
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/24/10.1063/1.3273397
10.1063/1.3273397
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