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Solid-state dewetting of patterned thin films
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10.1063/1.3268477
/content/aip/journal/apl/95/25/10.1063/1.3268477
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/25/10.1063/1.3268477
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

SEM images of (a) continuous and (b)–(d) patterned Au films that have undergone solid-state dewetting. (a) A continuous film dewets into islands/particles with broadly distributed sizes and spacings. The film thickness is 30 nm. (b) A single Au particle developed when an square pattern dewet. (c) A single row of three particles developed when a rectangular pattern dewet. (d) Double rows of two particles developed when a square pattern dewet. Scale .

Image of FIG. 2.
FIG. 2.

Characteristics of dewetted particles as a function of pattern width, , length, , and film thickness, . (a) The relationship between particle spacing and of long lines and closed circular lines patterned from 120 nm thick films. (b) The relationship between particle spacing and for rectangles of length . (c) Particle spacing vs. with fixed and (120 nm). (d) Average particle diameter as a function of film thickness for rectangles.

Image of FIG. 3.
FIG. 3.

Three-dimensional probability maps for (a) SOP and (b) SP ordering as a function of the pattern width to film thickness ratio and pattern length to film thickness ratio of rectangular patterns. The contours represent probabilities from 0 to 1.

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/content/aip/journal/apl/95/25/10.1063/1.3268477
2009-12-22
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Solid-state dewetting of patterned thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/25/10.1063/1.3268477
10.1063/1.3268477
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