Full text loading...
(a) Schematic of laser setup. A: ultarafast laser source; B1, B3: mirrors; B2: wave plate; C1, C2: beam expander; D: galvo scanner; E: telecentric lens; F: sample; G: chuck; and H: stage. (b) Schematic of the movement of laser beam during irradiation.
SEM micrographs of nanofibrous structure of laser irradiated surfaces with laser dwell time (a) 0.1, (b) 0.25, (c) 0.75, and (d) 1 ms.
Fibrous nanostructure layer thick as a function of laser dwell time.
Reflection spectra of the unstructured and laser irradiated silicon surface with different dwell times.
Micro-Raman spectra of unprocessed and laser processed silicon.
Article metrics loading...