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Effect of bias stress on mechanically strained low temperature polycrystalline silicon thin film transistor on stainless steel substrate
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10.1063/1.3193654
/content/aip/journal/apl/95/4/10.1063/1.3193654
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/4/10.1063/1.3193654
/content/aip/journal/apl/95/4/10.1063/1.3193654
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/content/aip/journal/apl/95/4/10.1063/1.3193654
2009-07-31
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of bias stress on mechanically strained low temperature polycrystalline silicon thin film transistor on stainless steel substrate
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/4/10.1063/1.3193654
10.1063/1.3193654
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