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(a) Specific contact resistivities, and (b) light reflectance at 460 nm of the Ag, Ni/Ag and Ni/Ag/Ni contacts as a function of annealing temperature.
SEM images for the (a) as-deposited Ag, annealed (b) Ag, (b) Ni/Ag, and (c) Ni/Ag/Ni contacts. Annealing was carried out at for 1 min in air ambient.
HRXRD profiles of the (a) Ag, (b) Ni/Ag, and (c) Ni/Ag/Ni contacts as a function of annealing temperature.
Off-axis phi scans of the Ag and Ni/Ag contacts for the GaN (0001), Ni (111), and Ag (111) reflections before and after annealing. Both contacts were annealed at for 1 min in air ambient.
Interplanar spacing of Ag (111) planes for the Ag, Ni/Ag, and Ni/Ag/Ni contacts as functions of annealing temperature.
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