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Laser-direct photoetching of metal thin film for the electrode of transistor
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10.1063/1.3207823
/content/aip/journal/apl/95/7/10.1063/1.3207823
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/7/10.1063/1.3207823
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic of the patterning process. (b) Optical microscopic image of the film surface taken after patterning.

Image of FIG. 2.
FIG. 2.

Optical profiler images of patterned Al films along with a height profile.

Image of FIG. 3.
FIG. 3.

Scanning electron microscopic image of a Ag film patterned by two-beam interference and a schematic of the patterning setup.

Image of FIG. 4.
FIG. 4.

Characteristics of a ZTO TFT with photoetched Al source and drain electrodes. voltage, voltage, and current.

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/content/aip/journal/apl/95/7/10.1063/1.3207823
2009-08-17
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Laser-direct photoetching of metal thin film for the electrode of transistor
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/7/10.1063/1.3207823
10.1063/1.3207823
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