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POM images for different alignments of LC on the thin films deposited by various methods and conditions. Although the oxygen concentration, , of thin films was in the range from 1.7 to 2, the alignment of LC was dependent on the deposition method.
XRR data and their best fits for thin films prepared by sputtering under the various deposition conditions. The solid lines represent the best fits. The reflectivity curves were shifted vertically for visual aid. The inset at upper-right corner shows the fit at lower angle, close to critical angles. A clear shift in the critical angles toward higher angles with increasing substrate temperature is observed.
Determined electron densities of the thin films from XRR data and their best fits. The thin films deposited by sputtering have relatively higher electron densities compared to others. In particular, the thin films deposited by sputtering at a higher substrate temperature have larger electron densities. LC aligns uniformly on the thin films with small electron density.
Various deposition methods and conditions for thin films.
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