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Growth rate (a) and refractive index, (b), of films produced at different oxygen partial pressures, a substrate temperature of , and magnetron power of 625 W. The insets show the configuration of the magnetron (1) with respect to the substrate (2) fixed to the substrate holder (3).
X-TEM images of films grown onto unheated substrates in HPFC mode [(a)–(c)], and at in LPFC mode [(d)–(f)].
Deposition parameters, thermal shift, and stress of the two different series of samples.
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