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Highly dense amorphous films with closed nanosized pores
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10.1063/1.3212731
/content/aip/journal/apl/95/8/10.1063/1.3212731
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/8/10.1063/1.3212731

Figures

Image of FIG. 1.
FIG. 1.

Growth rate (a) and refractive index, (b), of films produced at different oxygen partial pressures, a substrate temperature of , and magnetron power of 625 W. The insets show the configuration of the magnetron (1) with respect to the substrate (2) fixed to the substrate holder (3).

Image of FIG. 2.
FIG. 2.

X-TEM images of films grown onto unheated substrates in HPFC mode [(a)–(c)], and at in LPFC mode [(d)–(f)].

Tables

Generic image for table
Table I.

Deposition parameters, thermal shift, and stress of the two different series of samples.

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/content/aip/journal/apl/95/8/10.1063/1.3212731
2009-08-24
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Highly dense amorphous Nb2O5 films with closed nanosized pores
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/8/10.1063/1.3212731
10.1063/1.3212731
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