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Self-cleaning and surface recovery with arsine pretreatment in ex situ atomic-layer-deposition of on GaAs
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10.1063/1.3213545
/content/aip/journal/apl/95/8/10.1063/1.3213545
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/8/10.1063/1.3213545
/content/aip/journal/apl/95/8/10.1063/1.3213545
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/content/aip/journal/apl/95/8/10.1063/1.3213545
2009-08-26
2014-10-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-cleaning and surface recovery with arsine pretreatment in ex situ atomic-layer-deposition of Al2O3 on GaAs
http://aip.metastore.ingenta.com/content/aip/journal/apl/95/8/10.1063/1.3213545
10.1063/1.3213545
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