Full text loading...
(a) Schematic of a SNOP-cell. (b) The structure used for device modeling after assuming cylindrical symmetry. (c) An overhead view of the unit cell.
dependency of (a) , (b) , and (c) are shown for and and . The dashed lines represent the “effective” when a 5 nm reflector is added under the top contact with .
dependency of (a) , (b) , and (c) are shown for with a 5 nm reflector under the top contact, and and . The experimentally reported range for is highlighted for each graph.
A plot of efficiency vs NPL pitch for and . , with a 5 nm contact electron reflector.
Article metrics loading...