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DEP curved design: (a), (b), and (c) electrode array, curved electrodes, and dimensions of one pair, (d) schematic of the measurement set-up.
Variations in the DEP forces at different locations of the microchannel.
DEP manipulation of silica nanoparticles at constant flow rate of and ac potential of 15 V. Frequencies of (a) 250 kHz, (b) 5 MHz for 450 nm, (c) 250 kHz, and (d) 5 MHz for 230 nm particles.
Output profile observed for 230 nm silica nanoparticles at (a) 0 V, (b) 10 V, (c) 15 V, and for 450 nm particles at (d) 0 V (e) 10 V, and (f) 15 V. The right corner deviation from the scattering and waveguiding effect is due to the deviation caused by the narrowband flowing toward the output reservoir.
(a) Ratio of core to cladding intensity as a function of the applied voltage for the two intersections shown in the inset. (b) The variations in scattering efficiency vs diameter of silica particles.
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