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Interfacial self cleaning during atomic layer deposition and annealing of films on native (100)-GaAs substrates
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10.1063/1.3357422
/content/aip/journal/apl/96/11/10.1063/1.3357422
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/11/10.1063/1.3357422
/content/aip/journal/apl/96/11/10.1063/1.3357422
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/content/aip/journal/apl/96/11/10.1063/1.3357422
2010-03-18
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Interfacial self cleaning during atomic layer deposition and annealing of HfO2 films on native (100)-GaAs substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/11/10.1063/1.3357422
10.1063/1.3357422
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