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Comparing magnetotransport and surface magnetic properties of half-metallic films grown by low pressure and atmospheric pressure chemical vapor deposition
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10.1063/1.3367783
/content/aip/journal/apl/96/11/10.1063/1.3367783
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/11/10.1063/1.3367783
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD pattern of the films prepared under LPCVD and APCVD. APCVD film shows no peak while the peak intensities of and is 5:1 in the LPCVD film. peak in the AP film is away from its bulk position because of surface induced strain (Ref. 6). peak and L peaks due to tungsten in the x-ray source coming from the substrate are identified.

Image of FIG. 2.
FIG. 2.

(a) Resistivity curves of LPCVD and APCVD films from 5–400 K. Insets show the near behavior of resistivity. (b) Resistivity plotted (log-log) against .

Image of FIG. 3.
FIG. 3.

In plane AMR of LPCVD film with current and field perpendicular to each other measured at eight different temperatures. . Inset shows the AMR at different temperatures at 3 T applied field.

Image of FIG. 4.
FIG. 4.

XMCD obtained from the x-ray absorption on the edges of Cr on films from LPCVD, APCVD and films. Inset shows the in-plane M (h) loops of an LPCVD film measured in vibrating sample magnetometer.

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/content/aip/journal/apl/96/11/10.1063/1.3367783
2010-03-18
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparing magnetotransport and surface magnetic properties of half-metallic CrO2 films grown by low pressure and atmospheric pressure chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/11/10.1063/1.3367783
10.1063/1.3367783
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