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XRD pattern of the films prepared under LPCVD and APCVD. APCVD film shows no peak while the peak intensities of and is 5:1 in the LPCVD film. peak in the AP film is away from its bulk position because of surface induced strain (Ref. 6). peak and L peaks due to tungsten in the x-ray source coming from the substrate are identified.
(a) Resistivity curves of LPCVD and APCVD films from 5–400 K. Insets show the near behavior of resistivity. (b) Resistivity plotted (log-log) against .
In plane AMR of LPCVD film with current and field perpendicular to each other measured at eight different temperatures. . Inset shows the AMR at different temperatures at 3 T applied field.
XMCD obtained from the x-ray absorption on the edges of Cr on films from LPCVD, APCVD and films. Inset shows the in-plane M (h) loops of an LPCVD film measured in vibrating sample magnetometer.
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