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The (220) pole figures of films grown on n-Ge(111) substrate at the various annealing temperatures.
Cross-sectional (a) low-magnification, (b) high-magnification TEM images and the electron diffraction patterns at two different position, (c) and (d) of films on n-Ge(111) substrate at .
The saturation magnetization, (emu/cc) and average roughness, of the films at the various annealing temperatures.
Composition analysis at different position of films grown on n-Ge(111) substrate grown at .
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