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High stability of amorphous hafnium-indium-zinc-oxide thin film transistor
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10.1063/1.3387819
/content/aip/journal/apl/96/15/10.1063/1.3387819
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/15/10.1063/1.3387819
/content/aip/journal/apl/96/15/10.1063/1.3387819
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/content/aip/journal/apl/96/15/10.1063/1.3387819
2010-04-12
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High stability of amorphous hafnium-indium-zinc-oxide thin film transistor
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/15/10.1063/1.3387819
10.1063/1.3387819
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