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Crystallographic orientation dependence of compositional transition and valence band offset at interface formed using oxygen radicals
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10.1063/1.3407515
/content/aip/journal/apl/96/17/10.1063/1.3407515
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/17/10.1063/1.3407515
/content/aip/journal/apl/96/17/10.1063/1.3407515
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/content/aip/journal/apl/96/17/10.1063/1.3407515
2010-04-27
2014-11-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Crystallographic orientation dependence of compositional transition and valence band offset at SiO2/Si interface formed using oxygen radicals
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/17/10.1063/1.3407515
10.1063/1.3407515
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