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Terahertz emission from metal-organic chemical vapor deposition grown Fe:InGaAs using 830 nm to excitation
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10.1063/1.3427191
/content/aip/journal/apl/96/19/10.1063/1.3427191
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/19/10.1063/1.3427191

Figures

Image of FIG. 1.
FIG. 1.

(a) Bolometric THz detection system and (b) the THz-TDS system using a tunable OPO pump to generate THz radiation, detected using electro-optic sensing at 830 nm (probe beam 1) or the OPO signal (probe beam 2).

Image of FIG. 2.
FIG. 2.

THz intensities from emitters fabricated on wafers (a) and (b) , at etch depths A–C (corresponding to Fe:InGaAs thicknesses of , , and , respectively).

Image of FIG. 3.
FIG. 3.

Frequency spectra for excitation wavelengths from 1150 to 1550 nm of (a) and (b) . Inset: Time-domain pulse comparison between (solid) and (dashed) at 1550 nm excitation.

Image of FIG. 4.
FIG. 4.

Frequency domain measurements of taken at excitation and detection wavelengths ranging from 1150 to 1550 nm using (a) ZnTe and (b) GaP detection crystals.

Image of FIG. 5.
FIG. 5.

(a) THz power as a function of excitation wavelength for equivalent emitter pairs: and (squares); and (circles); and and (triangles). (b) Corresponding variation in photocurrent with bias voltage (1550 nm, 50 mW excitation) and (c) THz signal with excitation power, for emitters on wafers , , and (1550 nm excitation), and an LT:GaAs emitter under 800 nm excitation.

Tables

Generic image for table
Table I.

Layer structure for MOCVD-grown wafers used in this study.

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/content/aip/journal/apl/96/19/10.1063/1.3427191
2010-05-14
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Terahertz emission from metal-organic chemical vapor deposition grown Fe:InGaAs using 830 nm to 1.55 μm excitation
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/19/10.1063/1.3427191
10.1063/1.3427191
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