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Thickness dependence of the critical current density in superconducting films: A geometrical approach
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10.1063/1.3290254
/content/aip/journal/apl/96/2/10.1063/1.3290254
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/2/10.1063/1.3290254
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Approximations made to connect and . The simulations of (solid line) are carried out assuming (dotted line) and result in a finite at zero applied field. The simulated remains approximately at this value up to applied fields of , which is found by intersecting (broken line) and , and approaches above this field.

Image of FIG. 2.
FIG. 2.

Comparison of the simulated depression (points) to the solution of Eq. (4) (broken lines) assuming a power-law . After fitting the solution of the implicit equation is in excellent agreement with the numerical computation. (The data is shifted up by a factor of 2 for clarity.)

Image of FIG. 3.
FIG. 3.

Same as in Fig. 2 , but for a generalized Kim-model. Depending on the relative strength of to the self-field of the sample, is almost constant if (squares) or decays rapidly if (circles). Equation (4) fully accounts for this behavior.

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/content/aip/journal/apl/96/2/10.1063/1.3290254
2010-01-13
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thickness dependence of the critical current density in superconducting films: A geometrical approach
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/2/10.1063/1.3290254
10.1063/1.3290254
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