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(a) Light reflectance spectra of Ag, Ag(0.5 wt % In), Ag(1 wt % In), and Ag(5 wt % In) contacts after annealing at . (b) Change in ratios for Ag and Ag(In) contacts with annealing time at in air ambient.
(a) SIMS depth profiles of Ag(0.5 wt % In) contact (a) before and (b) after annealing at under air ambient. (c) HAADF image and EDS composition mappings of (d) In and (e) O of Ag(0.5 wt % In) contact annealed at .
SEM micrographs of (a) Ag contact annealed at , (b) Ag(0.5 wt % In), (c) Ag(3 wt % In), and (d) Ag(5 wt % In) contact annealed at .
(a) XRD profiles for Ag and Ag(5 wt % In) contacts, (b) Lattice constant change in Ag and Ag(In) contacts as a function of annealing temperature.
Off-axis phi scans of the Ag and Ag(0.5 wt % In) contacts for the GaN (102) and Ag (200) reflections before and after annealing. Both Ag and Ag(0.5 wt % In) contact are annealed at 300 and for 1 min in air ambient, respectively.
Changes in contact resistivity for Ag and Ag–In alloy contacts as a function of annealing temperature.
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