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Influence of positive bias stress on plasma improved InGaZnO thin film transistor
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10.1063/1.3453870
/content/aip/journal/apl/96/24/10.1063/1.3453870
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/24/10.1063/1.3453870
/content/aip/journal/apl/96/24/10.1063/1.3453870
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/content/aip/journal/apl/96/24/10.1063/1.3453870
2010-06-15
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of positive bias stress on N2O plasma improved InGaZnO thin film transistor
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/24/10.1063/1.3453870
10.1063/1.3453870
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