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Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes
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10.1063/1.3457475
/content/aip/journal/apl/96/26/10.1063/1.3457475
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/26/10.1063/1.3457475
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Figures

Image of FIG. 1.
FIG. 1.

XPS surface scans of postannealed CoFeB(60)/MgO(10)/CoFeB(20) (all thicknesses are in nanometer) samples grown with (a) EB-MgO and (b) rf-MgO. Curves represent A: CoFeB(20) surface, B: MgO(10)/CoFeB(20) interface, and C: CoFeB(60)/MgO(10) interface. Intensity is offset by for A. Note that boron is only seen at the top surface.

Image of FIG. 2.
FIG. 2.

EELS scans and HR-TEM micrographs on 10 nm thick [(a) and (c)] EB-MgO and [(b) and (d)] rf-MgO annealed at for 1 h. Scale bars are 2 nm.

Image of FIG. 3.
FIG. 3.

Normalized XPS intensities of CoFe (down triangle), Ta (square), Mg (up triangle), and B (circle) in (a) rf-MTJ and (b) EB-MTJ vs number of etching cycles, , in XPS system.

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/content/aip/journal/apl/96/26/10.1063/1.3457475
2010-06-28
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/26/10.1063/1.3457475
10.1063/1.3457475
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